Micro and Nanofabrication: MEMS Technology Essentials

This module provides an introduction to microelectromechanical systems (MEMS) and cleanroom fabrication. It covers the fundamental concepts of MEMS technology and the importance of cleanroom environments in micro and nanofabrication processes.

This module focuses on chemical vapor deposition (CVD), a key process in micro and nanofabrication. It explains the basic principles of CVD and demonstrates the cleanroom infrastructure used for CVD processes.

This module covers physical vapor deposition (PVD), detailing the two main PVD methods: thermal evaporation and sputtering. It explains the principles and applications of these techniques in micro and nanofabrication.

This module explores lithography, a crucial step in microfabrication. It covers the two main resist patterning methods: optical lithography and electron beam lithography, explaining their principles, processes, and applications in creating microstructures.

This module focuses on dry etching, which involves etching in a gas environment. It introduces concepts of etching directionality and anisotropy, provides guidelines for choosing dry etching processes for specific materials, and explains the theoretical concepts of plasma in dry etching equipment.

This module covers wet etching, which involves etching in a liquid environment. It introduces anisotropic wet etching of silicon substrates, isotropic etching of silicon, and thin membrane microfabrication techniques using wet etching.

This module describes various methods of inspection and metrology used in micro and nanofabrication. It covers four main technique categories: optical, mechanical, charged beam, and electrical, explaining their principles and applications in quality control and characterization of microstructures.